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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/11370
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dc.contributor.authorYakovtseva, V. A.-
dc.contributor.authorVorozov, N.-
dc.contributor.authorDolgyi, L.-
dc.contributor.authorLevchenko, V.-
dc.contributor.authorPostnova, L.-
dc.contributor.authorBalucani, M.-
dc.contributor.authorBondarenko, V. P.-
dc.contributor.authorLamedica, G.-
dc.contributor.authorFerrari, A.-
dc.date.accessioned2017-01-19T15:56:29Z-
dc.date.accessioned2017-07-27T12:15:10Z-
dc.date.available2017-01-19T15:56:29Z-
dc.date.available2017-07-27T12:15:10Z-
dc.date.issued2000-
dc.identifier.citationYakovtseva, V. Porous silicon: a buffer layer for PbS heteroepitaxy / V. Yakovtseva and others // Physica Status Solidi. – 2000. - Vol.182. - №195. - P.195 - 199. - DOI: 10.1002/1521-396X(200011)182:1<195::AID-PSSA195>3.0.CO;2-G.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/11370-
dc.description.abstractIn the present work, we report on the heteroepitaxial growth of PbS on porous silicon (PS). Epitaxial PbS films were grown by MBE on the surface of PS formed on the n+-type silicon (111) substrate. The films were comparable with films grown on BaF2 substrates. Beneficial influence of a PS buffer layer on the structure and properties of PbS epitaxial films was supported by implementation of sensitive Schottky-barrier photodiodes fabricated in these films.ru_RU
dc.language.isoenru_RU
dc.publisherWILEY-VCH Verlag GmbH & Co. KGaAru_RU
dc.subjectпубликации ученыхru_RU
dc.subjectporous siliconru_RU
dc.titlePorous silicon: a buffer layer for PbS heteroepitaxyru_RU
dc.typeArticleru_RU
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