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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/29062
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dc.contributor.authorDvornikov, O. V.-
dc.contributor.authorLovshenko, I.-
dc.contributor.authorStempitsky, V.-
dc.contributor.authorKhanko, V. T.-
dc.date.accessioned2018-01-09T12:45:08Z-
dc.date.available2018-01-09T12:45:08Z-
dc.date.issued2017-
dc.identifier.citationOptimization of structural and technological parameters of junction field-effect transistor with increased radiation hardness / O. Dvornikov and others // Nano-design, technology, computer simulations : proceedings of 17th International workshop on new approaches to high –tech (26-27 October, 2017). – Minsk : BSUIR, 2017. – С. 150 - 155.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/29062-
dc.language.isoenru_RU
dc.publisherБГУИРru_RU
dc.subjectматериалы конференцийru_RU
dc.subjectjunction field-effect transistorru_RU
dc.subjectincreased radiation hardnessru_RU
dc.titleOptimization of structural and technological parameters of junction field-effect transistor with increased radiation hardnessru_RU
dc.typeСтатьяru_RU
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