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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/33065
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dc.contributor.authorBorovik, A. M.-
dc.contributor.authorTrung Tran Tuan-
dc.contributor.authorStempitsky, V. R.-
dc.date.accessioned2018-10-01T06:45:29Z-
dc.date.available2018-10-01T06:45:29Z-
dc.date.issued2013-
dc.identifier.citationBorovik, A. Screening design and device/technology deep- submicron MOSFET simulation / A. Borovik, Trung Tran Tuan, V. Stempitsky // Nano-Design, Technology, Computer Simulation — NDTCS ’ 2013: proceedings of the 15th International Workshop on New Approaches to High-Tech, Minsk, June 11–15, 2013 / BSUIR. - Minsk, 2013. - P. 85 – 87.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/33065-
dc.description.abstractThe problem concerned to the verification of the significant parameters of the compact deep- submicron MOS-FET model was investigated in the presented work. The screening experiments methodology is used for the extraction of the significant parameters from the entire set of the model parameters.ru_RU
dc.language.isoenru_RU
dc.publisherБГУИРru_RU
dc.subjectматериалы конференцийru_RU
dc.subjectdeep- submicronru_RU
dc.subjectMOS-FETru_RU
dc.titleScreening design and device/technology deep- submicron MOSFET simulationru_RU
dc.typeСтатьяru_RU
Appears in Collections:NDTCS 2013

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