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Please use this identifier to cite or link to this item: https://libeldoc.bsuir.by/handle/123456789/33073
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dc.contributor.authorNelayev, V.-
dc.contributor.authorTran Tuan Trung-
dc.date.accessioned2018-10-01T08:04:01Z-
dc.date.available2018-10-01T08:04:01Z-
dc.date.issued2013-
dc.identifier.citationNelayev, V. Concept of new compact model of deep-submicron MOSFET / V. Nelayev, Tran Tuan Trung // Nano-Design, Technology, Computer Simulation — NDTCS ’ 2013: proceedings of the 15th International Workshop on New Approaches to High-Tech, Minsk, June 11–15, 2013 / BSUIR. - Minsk, 2013. - P. 70 – 72.ru_RU
dc.identifier.urihttps://libeldoc.bsuir.by/handle/123456789/33073-
dc.description.abstractConcept of new compact model for the simulation of deep submicron (DSM), nanometer-scale MOFFET transistor characteristics is presented. The proposed model is based on the use of traditional “compact” submicron MOSFET device model. Parameters of this model are verified by means of fitting procedure to results obtained by use exact physical models taking into account quantum effects accompanying charge carriers transfer in DSM MOSFET.ru_RU
dc.language.isoenru_RU
dc.publisherБГУИРru_RU
dc.subjectматериалы конференцийru_RU
dc.subjectdeep submicronru_RU
dc.subjectsubmicron MOSFETru_RU
dc.titleConcept of new compact model of deep-submicron MOSFETru_RU
dc.typeСтатьяru_RU
Appears in Collections:NDTCS 2013

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